Plasma, Ion Beam, Atomic Layer Deposition, Power Devices, RF Devices, 2D Materials, MEMs & Sensors

Oxford Instruments Plasma Technology


Oxford Instruments Plasma Technology provides a range of high performance, flexible tools to semiconductor processing customers involved in research and development, and production.

We provide etch and deposition process solutions for nanometre sized features, nanolayers and the controlled growth of nanostructures. These solutions are based on core technologies in plasma, ion beam and atomic layer deposition and etch. Products range from clustered cassette-to-cassette platforms for high-throughput production processing to compact stand-alone systems for R&D.