ET6000™

The FirstNano ET6000 is a multi-tube horizontal furnace system designed for batch wafer processing in R&D and pilot production. It can be configured with up to four independent process tubes, each capable of processing up to fifty 150mm wafers. The system supports both Atmospheric Pressure (APCVD) and Low-Pressure (LPCVD) processes and offers high-temperature options up to 1400°C. It is engineered for a variety of standard semiconductor thermal processes, including oxidation, annealing, diffusion, and the deposition of materials like polysilicon, silicon nitride, and various oxides (TEOS, PSG, BPSG).