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Product Overview
The FirstNano ET6308 is a compact, multi-tube horizontal furnace system designed for research and development and pilot production environments. It is a configurable multi-stack system that builds on over two decades of industry use. The system is engineered for a wide array of thermal processes, including wet/dry oxidation, atmospheric and low-pressure annealing, dopant diffusion, and the deposition of various thin films such as polysilicon (doped and undoped), silicon nitride, and LTO silicon dioxide. It features precise temperature control and options for configurable precursor gas management and effluent gas abatement.
Product Description
The FirstNano ET6308 is a compact, multi-tube horizontal furnace system designed for research and development and pilot production environments. It is a configurable multi-stack system that builds on over two decades of industry use. The system is engineered for a wide array of thermal processes, including wet/dry oxidation, atmospheric and low-pressure annealing, dopant diffusion, and the deposition of various thin films such as polysilicon (doped and undoped), silicon nitride, and LTO silicon dioxide. It features precise temperature control and options for configurable precursor gas management and effluent gas abatement.
Product Videos
CVD Equipment Corporation - First Nano
CVD Equipment Corporation - First Nano is the division of the company focused on providing turnkey chemical vapor deposition (CVD) and thermal processing systems for nanotechnology R&D. The division's EasyTube(R) systems are widely used in university and industrial labs for the synthesis of nanomaterials such as graphene, carbon nanotubes, and nanowires.
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