Instruments, Ion-Beam Deposition

Ion Beam Sputtering Cluster Tool

4Wave

Product DescriptionThe 4Wave ion beam sputtering cluster tool has maintained 4Wave?s 95% market share in the Vanadium Oxide Processing community (MEMS Market).Markets Include:Semi-ConductorMEMSData StorageOpticsWafer processing servicesApplications:Thermal ImagingEUV MaskMagnetic Tunnel JunctionsWhite Papers:Biased Target Ion-Beam Deposition of Spin valvesMore White PapersPublications:Click Here!Features:Low Energy Gridless Plasma SourceIon Assisted deposition (Gridless or Gridded Source)Hollow Cathode Electron Source6 x 8? or 3 x 12? or 2 x 16 ?biased target carouselPulse DC target from 1Hz to 250Khz up to -1300VUp to 200mm diameter process surfaceClosed loop control of film propertiesSubstrate plasma cleaning, etching oxidation, nitridationWater cooled, tilting, rotating,magnetic shuttered stageRobotically loaded, optically aligned wafersLoadlock withup to 25 wafersRF GriddedPlasma SourceIon Assisted deposition (Gridless or Gridded Source)Plasma BridgeElectron Source6 x 8? or 3 x 12? or 2 x 16? target carouselUp to 200mm diameter process surfaceClosed loop control of film propertiesSubstrate plasma cleaning, etching oxidation, nitridationWater cooled, tilting, rotating,magnetic shuttered stageRobotically loaded, optically aligned wafersLoadlock withup to 25 wafers