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Ion Beam Figuring plants

IBE-215

NTG Neue Technologien

The R-IBE 215 was designed to transfer lateral microstructures – which have been produced in a conventional method by optical lithography in photoresist – into hard optical material (glas, quartz, etc.). The material removal of photoresist and substrate are nearly equal so that the structure of the photoresist is fully transferred into the material.
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