By AMT&C Group (Advanced Magnetic Technologies & Consulting Group)
Versatile compact platform for A3B5, A2B6, A3N compounds growth Technologies: A3B5 STE75 is intended for scientific R&D in the field of modern semiconductor applications and provides a wide range of in-situ process monitoring opportunities. System capacity - 1×Ø3” Ultimate pressure - 5х10-11 Torr Ports for sources - 10 Ports for in-situ analytics - 4 Substrate heating in buffer chamber - Available Heater type - PBN/PG/PBN with high temperature uniformity and heating/cooling rate dynamics In-situ monitoring system - RHEED, RGA, BFM, OFM, IR-pyrometer, laser interferometer Key features 01 Compact footprint 02 PBN/PG/PBN heater provides high temperature uniformity and heating/cooling rate dynamics 03 Wide range of R&D applications 04 Extremely low LN2 consumption
Materials: H2 Advantages: - Low energy consumption - Absence of high-energy particles and ions - Integrated water cooling Technical characteristics Thermocouple: Type C Bakeout temperature: 200°С Operating temperature: 2000°С In-vacuum length: 190-400 mm In-vacuum diameter: 36 mm Mounting flange: 40CF
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Materials: N2, H2, SiH4 ADVANTAGES: - PBN ionization chamber - Integrated matching device - Inductive plasma Technical characteristics - Input power: 50-400 W - In-vacuum length: 292 mm - Mounting flange: 63/100CF
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Counter-rotating vane set provides for linear control across the entire operating range of the valve. The precise setting of vane rotation of the plates is realized due to the servo-based flap control system.
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