The following standard processes are available at microfab: possitive thin resist Typ resist film thickness STD film thickness AZ1518 1,5 µm – 3 µm 1,8 µm AZ ECI 3027 2,0 µm – 5 µm 2,7 µm positive thick resist Typ resist film thickness STD film thickness AZ10XT 5,0 µm – 20,0 µm 10,0 µm AZ40XT 15,0 µm – 100 µm 30,0 µm AZ4562 4,5 µm – 10 µm 6,8 µm negativ resist Typ resist film thickness STD film thickness AZ nLof2070 5,0 µm – 10,0 µm 7,0 µm “image reversal” resist Typ resist film thickness STD film thickness AZ5214E 1,0 µm – 2,0 µm 1,4 µm two-layer-bottomresist Typ resist film thickness STD film thickness AR-BR5460 0,8 µm – 2,0 µm 1,2 µm epoxy based photoresist Typ resist film thickness STD film thickness SU-8 3025 20,0 µm – 65,0 µm 25,0 µm
