NW
Lithography & NanopatterningFabrication & Surface Engineering

Custom Metalens Solutions (Meta Optical Elements)

By NIL Technology

Metalenses are a radical new flat lens technology that can disrupt optics used in various industries. At NILT, we specialize in custom-made metalens solutions, providing end-to-end services from design to mass production. We develop unique and tailored metalens solutions that cater to the specific needs of our customers, having fast turnaround times for metalens prototyping in the NIR/SWIR/VIS spectra, leading to mass production. Metalenses are optimal for various applications as smartphones, AR/VR, wearables, automotive, robotics, and IoT platforms, with applications ranging from depth-sensing and presence detection to face identification, gesture recognition, eye-tracking, driver-monitoring systems, and medical instrumentation. Metalenses lend themselves to compact lens and module architectures. In near-infrared applications, the lenses are produced using a silicon-on-glass substrate, which makes them mechanically robust and thermally stable. NILT MOEs are manufactured and assembled using semiconductor-class equipment and deliver consistently high performance in mass production. At NILT, we have a rich heritage in designing and developing advanced optics. We possess a comprehensive in-house process chain knowledge encompassing design, mastering, prototyping, testing, characterization, and manufacturing capabilities for meta optics. Our proficiency lies in years of experience in manufacturing micro- and nano-patterned surface relief structures, harnessing nanoimprint lithography (NIL). As a leader in nanostructured mastering and fast prototyping turnaround, we leverage our extensive experience to deliver mass-production metalens solutions, and we are constantly demonstrating record-high metalens results. Our ability to take customers’ requirements and turn them into optical solutions optimized over the entire process chain differentiates us from others. NILT MOE produced by nanoimprint lithography. Image from a near Infrared imaging system using a single MOE designed for 940 nm wavelength. The demonstrated NILT image has excellent resolution for NIR imaging, all the way to the edge, and is comparable to images captured with a multi-element refractive lens.