Electron beam lithography, often referred to as e-beam lithography or EBL, is a versatile tool capable of making almost any kind of pattern imaginable within nanotechnology and with very small lateral dimensions. We work primarily on Jeol JBX9500FSZ and Raith EBPG5200 systems. NIL masters are most often patterned by electron beam lithography, in combination with a variety of pre- and post-processing as required.
