By XRnanotech
Assemble your next prototype or the new generation of your product from our large selection of micro- and nanolithography process modules. Our experts are waiting to support you and accompany you from the first prototype to upscaling. Technology Modules Typical materials: Photoresists, Au, Cr, Si, SiO₂, Glass Applications: Photomasks, Lift-off masks, Microfluidics, MEMS patterning Substrate Size: 200 mm x 200 mm UV Lithography Electron Beam Lithography Typical materials: PMMA, HSQ, Au, Cr, Si, Glass, Diamond Applications: DOEs, Nanophotonics, High-resolution masks, Quantum devices Substrate Size: 200 mm Wafer Free-Form Grayscale Typical materials: Photoresists (e.g. AZ, ma-P) Applications: Microlens arrays, Freeform optics, Beam shapers Substrate Size: 200 mm x 200 mm X-Ray LIGA Typical materials: PMMA, SU-8, mr-X, Au, Ni, NiCo Applications: Microstructures, Gratings, Molds Substrate Size: 100 mm Wafer Reactive Ion Etching Typical materials: Si, SiO₂, Si₃N₄, Metals Applications: AR/VR, Photonic Devices, Nanoporous Membranes Substrate Size: 200 mm Wafer Deep Reactive Ion Etching Typical materials: Si Applications: MEMS, Microfluidics, Kinoform optics Substrate Size: 200 mm Wafer Electroplating Typical materials: Au, Ni, NiCo, Cu,… Applications: Gratings, MEMS, ICs, Mold inserts, High-density metal structures Substrate Size: 200 mm x 200 mm Metal Assisted Chemical Etching Typical materials: Si Applications: Ultra High Aspect Ratio Nanostructures, Black silicon, Photonic surfaces Substrate Size: 200 mm Wafer We will get in touch with you usually until the next business day.
