NW
Lithography & NanopatterningFabrication & Surface Engineering

Binary Masks

By Toppan Photomasks Inc.

The structure of a binary mask is simple; it is a photomask blank covered with patterned layer of opaque material. Its transmission characteristics are either transparent or non-transparent. A Binary mask is used for building a pattern in which line width is larger than the exposure wave length. Tekscend Photomask and its blanks vendor have co-developed new types of binary blanks with superior workability (OMOG: Opaque MoSi on Glass). We have managed to create blanks for binary masks with better CD performance and higher resolution.