By Eulitha AG
Semiconductor nanowires, crucial for advanced electronic and optoelectronic devices like high-brightness LEDs, are developed on templates with nanoscale holes using DTL technology. This technology ensures precise and uniform creation of the necessary hole arrays on substrates like GaN, each about 100nm in diameter. Unlike nanoimprint and e-beam lithography, DTL offers incredible speed, cost-efficiency, and reliability, making it ideal for producing dense and sparse nanowire arrays. Eulitha’s DUV systems deliver the high resolution required for these applications.
