By Melbourne Centre for Nanofabrication
Electron beam lithography (EPG5000PlusES) Focused ion beam (FEI Helios Nanolab 600 Dual FIB-SEM) Hot embosser (EVG 520IS) Nano imprint lithography (EVG6200) PDMS laboratory Photolithography (EVG 6200 mask aligner) Photolithography (SUSS MA6) Photolithography (ABM UV flood light source) Spin coating (SUSS Delta 80RC) Spin coating and wafer development (Pico Track PCT-150RRE) Intelligent Micropatterning (IMP SF-100) Thermal Scanning Probe Lithography (NanoFrazor Explore) Phabler (PhableR-100C) Critical Point Dryer (Quorum K850WM) Robotic Wet Bench (Amerimade Technology 6 ft Semi-Auto Wet Process Station) IPA Vapor Drying Wet Bench (Amerimade Technology 2 ft IPA Vapor Drying Station) Manual Wet Bench (Amerimade Technology 4 ft FAS)
