Deep UV lithography (in short DUV lithography) is an optical projection type lithography technique where the pattern on a reticle/mask is projected to the wafer surface through a 4X or 5X optical system. The wavelengths used for DUV lithography are 248 nm or 193 nm. DUV lithography is a high-speed lithographic technology suitable for large area masters of discrete components. We work on two 248 nm DUV tools. The minimum achievable lateral dimensions with these tools are 200-250 nm.
