By SAMCO Inc.
Samco’s Xenon difluoride (XeF2) Etching System is mainly using for the etching of the Si sacrificial layer for fabrication of MEMS (Micro Electro Mechanical Systems) devices. This dry process avoids the destruction of devices due to stiction, which is a problem in the wet process, and eliminates the need for pretreatment and post-processing in the wet process. As a tabletop type system, VPE-4F offers a convenient and compact design.
