By SAMCO Inc.
Atomic Layer Etching (ALE) of silicon enables precise material removal with unparalleled surface smoothness and dimensional accuracy. This controlled process is ideal for applications requiring atomic-level precision, such as advanced semiconductor devices, MEMS, and photonic components. With its potential for low-damage etching and high selectivity, ALE of silicon opens pathways for innovations in next-generation microelectronics and nanoscale devices.
