Plasma cleaning has emerged as a vital technique for improving the surface quality and functionalization of graphene, a material renowned for its exceptional electrical, thermal, and mechanical properties. As graphene finds increasing applications in electronics, sensors, and other advanced technologies, maintaining a pristine, contaminant-free surface becomes critical. Plasma cleaning offers a precise, controlled method to remove organic contaminants, residuals from synthesis, and other impurities that can compromise graphene's performance. During the production of graphene, contaminants such as polymers from transfer processes or residual solvents from chemical exfoliation can adhere to the graphene surface. Plasma cleaning effectively removes these unwanted materials, ensuring that the graphene retains its high conductivity and other unique properties. By using plasma cleaning, researchers can achieve a cleaner, more uniform surface that is ideal for electronic and optoelectronic applications.
