Vistec Electron Beam is a leader in the design and manufacturing of electron-beam lithography systems, which are based on the Variable Shaped Beam (VSB) principle. In conjunction with extended writing strategies and efficient layout data processing the electron-beam lithography systems are capable to fully expose 300 mm wafers and 9 inch masks on the same platform. The application areas span a wide range of existing and emerging applications including silicon direct write, compound semiconductor, mask making, advanced research, integrated optics and photonics for customers in both industry as well as Advanced Research.
Jena
1996
51–200
