Onto Innovation Launches Next Generation OCD Metrology Platform to Enable Process Control for Advanced AI Devices
- Mateo Cardinal
- Sep 24
- 3 min read

Onto Innovation Inc. (NYSE: ONTO) today introduced the Atlas® G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face tighter structural dimensions, shrinking by up to 30% per generation. These smaller geometries demand greater precision in controlling individual nanowire measurements in GAA and smaller DRAM cell block sizes for high bandwidth memory (HBM). The Atlas G6 system introduces advanced optical technologies that deliver measurement accuracy and the small spot size needed to support these evolving requirements, enabling robust process control for next generation devices. The Atlas G6 system has already secured multiple production orders from leading logic and memory manufacturers.
The Atlas G6 system delivers enhanced signal to noise performance even with significantly smaller spot sizes, enabling new and critical metrology capabilities for GAA and HBM technologies. For GAA devices, precise control of each individual nanowire is critical to ensure electrical performance required to meet higher transistor speeds and lower power consumption targets of next generation devices. The Atlas G6 system addresses this challenge with enhanced real-time stabilization technologies that improve measurement precision and accuracy.
For HBM, smaller DRAM cell block sizes boost bandwidth efficiency, reduce power consumption, and improve latency. The Atlas G6 system’s smaller spot size allows for direct on-device measurements in DRAM cell blocks, enabling tighter process windows and ultimately helping to improve yield and long-term reliability. Also, the system introduces an additional data channel, which when combined with Onto’s proprietary Ai Diffract™ OCD analysis software and model-guided machine learning algorithms, strengthens recipe robustness and shortens time to solution.
“As the latest evolution of our industry-leading and award-winning Atlas family, the Atlas G6 system provides control of device features that were previously difficult to measure,” said Ido Dolev, executive vice president of product solutions for Onto Innovation. “Advancements in AI technologies depend on innovations in process control, and the Atlas G6 metrology system sets a new benchmark for optical metrology performance.”
To learn more about the Atlas G6 metrology system, visit our booth L0628 at SEMICON® Taiwan, contact us or reach out to your local sales team.
About Onto Innovation Inc.
Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that includes un-patterned wafer quality, 3D metrology spanning chip features from nanometer scale transistors to large die interconnects, macro defect inspection of wafers and packages, metal interconnect composition, factory analytics, and lithography for advanced semiconductor packaging.
Our breadth of offerings across the entire semiconductor value chain combined with our connected thinking approach results in a unique perspective to help solve our customers’ most difficult yield, device performance, quality, and reliability issues. Onto Innovation strives to optimize customers’ critical path of progress by making them smarter, faster and more efficient. Headquartered in Wilmington, Massachusetts, Onto Innovation supports customers with a worldwide sales and service organization.



























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