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SemiconductorOctober 12, 2026 · 1 min read

Particle Measuring Systems launches Chem 20 SM 20 nm solvent particle counter

Particle Measuring Systems launches Chem 20 SM 20 nm solvent particle counter. Image: Particle Measuring Systems
Particle Measuring Systems launches Chem 20 SM 20 nm solvent particle counter. Image: Particle Measuring Systems

Niwot, 12 October 2026. Particle Measuring Systems (PMS) has launched the Chem 20 SM, a 20 nm solvent particle counter engineered for use in hazardous areas. The company said the product is the first 20 nm particle counter certified for hazardous-area solvent monitoring.

The Chem 20 SM is designed to monitor solvents such as IPA and PGMEA. It provides inline particle monitoring with hazardous-area certifications without the customer-built containment enclosures commonly used today, according to PMS.

The company said semiconductor manufacturers have faced challenges monitoring particles in hazardous solvent environments. Traditional approaches often require expensive, custom-built nitrogen-purged enclosures around standard particle counters, adding complexity, cost and maintenance requirements.

PMS said the Chem 20 SM will meet global hazardous-location requirements, including IECEx, ATEX and NFPA 70 NEC Class I Division 2 standards. "By combining 20 nm particle detection with hazardous-area certification and a compact, installable design, we enable customers to monitor critical solvent chemistries more efficiently and confidently," said Badr Astiphan, Vice President of Particle Measuring Systems.

The company said semiconductor manufacturers and chemical suppliers can monitor contamination closer to the process, identify yield-limiting particle events earlier and simplify hazardous-area deployment without sacrificing performance or safety.

Source: Particle Measuring Systems news