Complete thin film measurement systems for QC and process development. The Aquila Instruments nkd-series is a range of instruments specifically designed to overcome the problems usually encountered when measuring the optical performance of thin-film coatings on transparent and semi-absorbing substrates. The nkd series of spectrophotometers measure total transmittance and total reflectance in a precisely defined experimental geometry with known polarisation. This is used to powerful advantage by the integrated analysis software which can determine the thickness, complex refractive index and absorption coefficient of a coating from the comprehensive measured data. For optical thin films there are three important material parameters which need to be known: refractive index (n) and extinction coefficient (k), both as a function of wavelength, and the thickness (d). These three parameters determine completely how a thin film responds to incident light. They are important parameters for designers and manufacturers of coatings but users of coated optics will also be concerned with the end result: the actual transmittance and/or reflectance of a coated sample. The nkd instruments satisfy both requirements. Non-destructive measurement of complex samples such as absorbing dielectrics, metallic, birefringent and multilayer films is possible on all substrate types from transparent glasses to polymers, semiconductors and metals. The Aquila nkd series provides: • Simultaneous measurement of total transmittance and reflectance • True Photometric precision - well defined indicent polarisation • Accurate determination of n k and d from one measurement • Database of known materials • Powerful analysis software • Range of options and accessories In a unique desktop instrument designed to make thin film measurement fast and affordable. The Aquila nkd Spectrophotometer is used for measuring the photometric performance, film thickness, refractive indices, absorption and uniformity of: > Solar panels & Dielectric layers • Flat panel displays • Ophthalmic Lenses • Surface Coatings & Treatments • Polarising and dichroic coatings • Semiconductors • Telecoms components • Electrodes & Sensors • CD & DVD optical systems • Solar control glass • Decorative materials • Packaging materials
Flexible thin film measurement instrument. The nkd-8000, is the most advanced design in our innovative range of desktop thin film measurement systems, purpose built for enhanced functionality and flexibility, to meet all your thin film analysis requirements – from research to production and quality control. Non-destructive determination of refractive index, extinction coefficient and film thickness measurement, of single or multi-layer thin films and substrates is achieved using the simultaneous measurement of Transmittance and Reflectance spectra. This capability is unique to the nkd range and guarantees photometric precision, unattainable with conventional spectrophotometers. Key features of the nkd thin film analysis systems, are the ability to capture spectra using polarised (s- and p-) or unpolarised light and at continuously varying angles of incidence, enabling thin, multilayer and complex films to be analysed with ease. The X Y mapping platform enables film thickness and refractive index profiling of entire substrates and scanning can be performed over a wide spectral range. Full data capture and thin film analysis takes only 15 minutes and the powerful Pro-Optix™ software makes the whole process of obtaining film thickness and dispersion for your coatings fast and simple. In fact, for a single layer of unknown poperties, the nkd can obtain the film thickness, refractive indices (dispersion) and absorption coefficient – from just one measurement! Transparent samples are handled with ease and are infact an advantage as they allow for the determination of absolute absorption (1-(T+R)). Transparent substrates require no roughening or blackening of the back surface - they are simply placed as manufactured on the sample stage. Metallic films are also catered for in the analysis with metal algorithms. A wide selection of accessories are available, making this the most flexible thin film analysis system available.
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Thin Film measurement on your desk top. The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance - simultaneously. No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces. Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles, (see the nkd-8000 for continuously variable angles of incidence). Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and derermining optical properties fast and simple A wide selection of accessories are available, ensuring that there is no compromise in the collected spectra.
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Thin Film measurement on your desk top. The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance - simultaneously. No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces. Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles. Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and derermining optical properties fast and simple. A wide selection of accessories are available, ensuring that there is no compromise in the collected spectra.
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Flexible measurement platforms for research. When you are developing new coatings and substrates – you need the nkd to provide you with the most spectrocopic information available from a thin film analysis system. When you have more than one type of thin film measurement to make, multiple applications and analysis of complex structures, new and absorbing films, then you need the nkd - specifically designed for the most demanding applications. It provides: – Space for larger samples – – Variable angle measurements – – Flexibility of measurement type – Measure T & R simultaneously. Determine layer thickness for single and multilayers with ease. Determine optical properties and absorption for all types of materials - transparent, absorbing, dielectric, polymers, semiconductors, organic semiconductors and polymers etc. Take advantage of advanced features such as a the heated stage, sample mapping and small spot sizes. The extensive application capabilities of the nkd include: • Transparent substrates • Thick and thin layers • High and low index (n) layers • Plastics & polymers • Optical coatings • Display technology • Organic and Inorganic semiconductors • Metal films • Dielectric films • DBR structures
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