AJA offers HV and UHV magnetron sputtering systems for research scale physical vapor deposition ranging from compact (Orion Series) to complex (ATC Series) to systems for epitaxial film growth by sputtering (SBE Series) plus small batch coaters (Batch Series). These sputtering systems can be configured in either con-focal, normal incidence, off-axis, glancing angle, or combination of target to substrate orientations. Substrate holder features include radiant heating (1000°C), azimuthal rotation, RF/DC biasing, z-motion, cooling (H2O or LN2), tilting, or planetary motion. Sputter Beam Epitaxy Systems Price range: $400,000 - $650,000+ 14" or 18" chamber Ø 1.5" or 2" diameter sputter sources In-situ tilt source option Substrate holders to 4" Ø Load-lock and cassette options Auto-loading & Computer Control
