The SBE-6 Series Sputter Beam Epitaxy (SBE) Deposition System combines deposition quality that rivals molecular beam epitaxy (MBE) with the ease, flexibility, and lower cost of sputtering. This is accomplished through a unique sputtering geometry, developed through extensive research. The SBE-6 Series enables the co-deposition or sequential deposition of up to six distinct materials while minimizing cross-contamination. The system has proven performance to grow epitaxial films of high crystallinity, precise stoichiometry and atomically flat interfaces. A quartz crystal monitor provides deposition rate calibration from elemental targets, providing the option to precisely form compounds without the expense or difficulty of compound targets. This advanced platform integrates years of refinement in deposition dynamics within AJA International’s proven engineering framework and high-performance components recognized globally for their reliability.
