The con-focal Orion systems utilize motorized, rotating substrate holders to achieve excellent uniformity, allow the co-deposition of alloy films, and facilitate the deposition of pristine, ultra-thin film multilayers since the substrate is always “in the plasma.” Substrate heaters are available to reach up to 1000°C and feature reactive gas injection rings, RF/DC bias capability, in-situ manual or motorized Z motion (for working distance adjustment and load-lock transfer) and in-situ mask exchange (available only with certain configurations). Cooled substrate carriers utilizing either water or LN2 are also available depending on the application requirement. For combinatorial chemistry applications (simultaneously deposited gradient films), both heated and cooled substrate holders which do not require rotation during deposition, are offered. A wide variety of custom substrate holders have also been designed, over the years.
