GASKET Product Series Product Highlight SiMPore Translucent PDMS sheets are cut from centrifugally cast, platinum-cured silicone. Our PDMS sheets exhibit glass-like transparency and exceptional compliance as a 40 durometer, Shore A material. Available in fi ve thickness ranges and in either double-linered format (250μm to 800μm) or single liner (1.6mm, 3.2 mm) formats to protect the surface during handling and fabrication. Mechanical Data SiMPores's Translucent PDMS sheets are manufactured and converted to the dimensions and tolerances specified in the tables below. Custom dimensions and thicknesses are available on request. Standard Thickness & Tolerances - GASKET-250: 0.254 mm, ± 0.051 mm - GASKET-500: 0.508 mm, ± 0.076 mm - GASKET-800: 0.787 mm, ± 0.102 mm - GASKET-1600: 1.600 mm, ± 0.152 mm - GASKET-3200: 3.175 mm, ± 0.203 mm Standard Dimensions & Tolerances - GASKET-[250-3200]: Width 175 mm, Length 225 mm, Tolerance ± 10.0 mm Material Properties SiMpore's PDMS sheets conform to the following material specifications. Applicable test methods are provided for reference where applicable. Standard PDMS Sheet Material Properties - Color: Transparent (Visual Inspection) - Thickness (mm): 0.248-3.2 (Vendor) - Density (g/cm^3): 1.07 (Vendor) - Durometer, Shore A: 41 (ASTM D2240), Specification 40 ± 5 - Compression Set (%): <35 (ASTM D395) - Tensile Strength (mPa): 7.17 (ASTM D412), Specification > 4.8 - Elongation (%): 325 (ASTM D412), Specification > 200 - Tear Resistance (PPI): 112 (ASTM D624), Specification > 70 - Temperature Range (⁰C): -55 to +220 (Vendor) - Liner Material: PET (Vendor) Test methods and results are provided by the OEM manufacturer. Disclaimer The information provided in this Technical Data Sheet (TDS) is for information purposes only, and does not constitute a warranty expressed or implied guaranteeing product attributes or user application or results using these materials. The end user is solely responsible for determining the suitability of these materials for a particular purpose.
Pure silicon grids offer greater stability at high beam currents and at moderately high annealing temperatures (up to 600°C). Increases stability Enables alternative for elemental analysis Pure silicon grids enable elemental analyses by EDAX and EELS of samples containing nitrogen and/or carbon due to their composition and their minimal background signal. Reduces chromatic blur Compared to carbon grids, pure silicon grids have half the chromatic blur. 15 nm thick Pure Silicon TEM Grids are our most robust pure silicon films; these amorphous films offer plasma cleanability, tunable surface hydrophobicity, and the ability to analyze for nitrogen and carbon without background signals Our 5nm amorphous silicon TEM windows are less prone to elastic scattering than alternative technologies Long two slot 50 X 1500 micron windows enable high angle electron tomography imaging
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Silicon nitride grids are well-suited for use in environmental TEMs where dynamic processes are observed at high temperatures. Ideal for temperatures 1000°C Flat and uniform surface Silicon nitride grids incorporate LPCVD, low-stress (~250MPa), non-stoichiometric silicon nitride which provides uniformly flat, insulating, and hydrophobic surfaces. Made for stable imaging Nanoporous and microporous silicon nitride grids support stable suspension of nanoscale materials for imaging without a background. Microporous and nanoporous silicon nitride permit free suspension of deposited material for background-free imaging 10, 20 & 50 nm thick Silicon Nitride TEM Grids are our most robust, flat, and plasma cleanable substrates for demanding sample preparation procedures
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Our Electron X-Ray microscopy windows are available with freestanding silicon nitride or G-FLAT® silicon dioxide membranes in a range of window sizes and membrane thicknesses for various vacuum and temperature conditions. Our 500 x 500 micron silicon nitride membranes with 50 nm and 100 nm thick single windows withstand full vacuum differential pressure and permit high X-Ray transmission across a wide spectrum. Our 1,500 x 1,500 micron and 2,500 x 2,500 micron silicon nitride membranes offer large imaging areas and high X-Ray transmission and are compatible with partial vacuum conditions. State-of-the-art manufacturing processes and an expert engineering team allow us to offer all variations of our X-Ray Windows at competitive prices. Unlike our competitors, all our X-Ray Electron Microscopy products are made entirely in the USA. Incredibly durable Low-stress LPCVD Silicon Nitride membranes are mechanically strong and well-suited for high temperature and differential pressure environments. Plasma cleanable All of our X-Ray Windows can be vigorously plasma cleaned to remove organic contamination. Increases uniformity Flat, uniformly deposited films provide consistent backgrounds with low field-to-field variability and high X-Ray transmission.
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Research findings indicate that viral particles prepared on Cryo-SiN exhibit greater contrast in comparison to those prepared on holey carbon films under the same conditions. Greater contrast Less imaging It is significantly easier to calculate 3D reconstructions of viral particles when they’re prepared on Cryo-SiN, as they require only a fraction of the images required for samples prepared on holey carbon films. Our Cryo EM grids include Silicon Nitride alone or with unique carbon coatings to provide superior bridging and maximum observable specimen sites of organic and biologic solutions and suspensions.
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