Capture and Analyze Microplastics on One Filter nanomembranes for microplastics separation and analysis Silicon Nitride Membrane Filter Discs Key Product Features - Capture and analyze particles of interest on the same filter, saving hands-on labor - Exceptionally thin (400 nm) thick filters offer high flow rates and fast filtration, reducing sample preparation time. - Convenient 13 mm and 25 mm filter formats compatible with vacuum filtration and stirred cell apparatus. - MicroSlit-shaped pores offer sharp cut-offs for capturing particles of interest. - Highly inert SiN membrane material is broadly compatible with acids, bases, and solvents. - Small membrane surface area (6.3 mm^2) concentrates captured particles for ease of identification. - Available with optional gold coating for compatibility with fluorescent microscopy and Raman and infrared spectroscopy. 13mm Filter Disc Filter Clear Water Flow Rates (via vacuum filtration) SiMPore Microslit Silicon Nitride (SiN) membrane filter discs are uniquely suited to a wide range of particle separation challenges, particularly microplastics analysis. Our unique SiN membrane system enables efficient sized-based separation and analysis directly on the filter membrane, simplifying analysis workflow and decreasing sample handling complexity. Available metal coatings enable low background for fluorescence, Raman, IR, and electron microscopy. Part Number Configurator Format: [Product Series] [Disc Diameter – mm] – [Filer Cutoff - μm] – [Surface Coating Type] Example: [FD13-6.0-Au]; 13mm diameter filter, 6 μm cutoff with 120nm Gold Coating Product Catalog Product Series Disc Diameter (mm) Nominal Cutoff (μm) Surface coating FD 13 25 37 47 0.35 0.5 1.0 2.0 4.0 6.0 8.0 10.0 NC (Non-coated) Au (120nm Gold) Al (120nm Aluminum) LB (Low-Binding) Disclaimer The information provided in this Product Information Sheet is for informational purposes only, and does not constitute any warranty, expressed nor implied, guaranteeing product attributes, suitability for any application, nor any results with use of the product. These products are intended for research-use only applications. Suitability for any application or purpose rest solely with the end-user.
Pure silicon grids offer greater stability at high beam currents and at moderately high annealing temperatures (up to 600°C). Increases stability Enables alternative for elemental analysis Pure silicon grids enable elemental analyses by EDAX and EELS of samples containing nitrogen and/or carbon due to their composition and their minimal background signal. Reduces chromatic blur Compared to carbon grids, pure silicon grids have half the chromatic blur. 15 nm thick Pure Silicon TEM Grids are our most robust pure silicon films; these amorphous films offer plasma cleanability, tunable surface hydrophobicity, and the ability to analyze for nitrogen and carbon without background signals Our 5nm amorphous silicon TEM windows are less prone to elastic scattering than alternative technologies Long two slot 50 X 1500 micron windows enable high angle electron tomography imaging
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Silicon nitride grids are well-suited for use in environmental TEMs where dynamic processes are observed at high temperatures. Ideal for temperatures 1000°C Flat and uniform surface Silicon nitride grids incorporate LPCVD, low-stress (~250MPa), non-stoichiometric silicon nitride which provides uniformly flat, insulating, and hydrophobic surfaces. Made for stable imaging Nanoporous and microporous silicon nitride grids support stable suspension of nanoscale materials for imaging without a background. Microporous and nanoporous silicon nitride permit free suspension of deposited material for background-free imaging 10, 20 & 50 nm thick Silicon Nitride TEM Grids are our most robust, flat, and plasma cleanable substrates for demanding sample preparation procedures
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Our Electron X-Ray microscopy windows are available with freestanding silicon nitride or G-FLAT® silicon dioxide membranes in a range of window sizes and membrane thicknesses for various vacuum and temperature conditions. Our 500 x 500 micron silicon nitride membranes with 50 nm and 100 nm thick single windows withstand full vacuum differential pressure and permit high X-Ray transmission across a wide spectrum. Our 1,500 x 1,500 micron and 2,500 x 2,500 micron silicon nitride membranes offer large imaging areas and high X-Ray transmission and are compatible with partial vacuum conditions. State-of-the-art manufacturing processes and an expert engineering team allow us to offer all variations of our X-Ray Windows at competitive prices. Unlike our competitors, all our X-Ray Electron Microscopy products are made entirely in the USA. Incredibly durable Low-stress LPCVD Silicon Nitride membranes are mechanically strong and well-suited for high temperature and differential pressure environments. Plasma cleanable All of our X-Ray Windows can be vigorously plasma cleaned to remove organic contamination. Increases uniformity Flat, uniformly deposited films provide consistent backgrounds with low field-to-field variability and high X-Ray transmission.
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Research findings indicate that viral particles prepared on Cryo-SiN exhibit greater contrast in comparison to those prepared on holey carbon films under the same conditions. Greater contrast Less imaging It is significantly easier to calculate 3D reconstructions of viral particles when they’re prepared on Cryo-SiN, as they require only a fraction of the images required for samples prepared on holey carbon films. Our Cryo EM grids include Silicon Nitride alone or with unique carbon coatings to provide superior bridging and maximum observable specimen sites of organic and biologic solutions and suspensions.
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