Dual UHV ATC 1800/2200E (Sputter/ E-Beam) system with (4)A320-XP 2 " UHV sputter sources with in-situ tilt, (2) 4-pocket 15cc UHV linear e-guns, RF ion source, 1200 l/s turbopumps,850°C rotating substrate heaters with RF bias, computer control,and common vertex load-lock for 100 mm Ø substrates.
