Advanced 3D modeling software for optical CD The Nova MARS® software package is a multi-channel physical modeling engine designed for complex 2D/3D devices in advanced process node fabrication. A complete solution for scatterometry model development, material characterization, and recipe optimization, Nova MARS® utilizes physical and process-related knowledge to solve CD applications in complex structures. The solution offers comprehensive capabilities that combine physical, machine learning, and hybrid modeling, as well as disruptive algorithms. This rich and diverse “solution toolbox” allows semiconductor manufacturers to flexibly solve ever-growing complex metrology challenges based on their unique requirements and needs. Nova MARS supports Nova’s leading dimensional metrology tools, and works in seamless connectivity with Nova HPC and Nova Hub. Highlights and Benefits Advanced Library Solutions Fast and precise library generation, resulting in dedicated library solutions for enhanced productivity. Improved time to solution and accuracy with advanced library-building techniques Solving Complex Structures 2D/3D structure support with fast calculations for modeling complex structures. Unique proprietary algorithms to target complex 3D and HAR structures, addressing the most advanced logic and memory challenges Multi-Channel Optimization Algorithm optimization based on process knowledge, sensitivity, and parameter correlation. Holistic approach enhances the accuracy and repeatability of the metrology solution Multi-Model Solution Physical, machine learning, and hybrid modeling capabilities provide high flexibility in solving diverse metrology challenges. Powerful Physical Modeling nables rich physical modeling of the most complex 3D device geometries, including material characterization through StackMaker and MatMaker respectively. Why Nova MARS®? As production for advanced process nodes becomes increasingly complex, IC manufacturers need a comprehensive solution that is both accurate and productive to keep them competitive. Nova MARS®, complemented by Nova HPC, breaks a longstanding paradigm. Manufacturers of advanced 3D structures, such as FinFET, GAA, 3D NAND, and DRAM, no longer need to sacrifice accuracy or productivity. Instead, they can leverage the combined offering to increase robustness and accuracy, improve productivity, expand their range of edge applications, and achieve faster time-to-solution. Nova MARS® leverages advanced, unique algorithms to optimize the speed and accuracy of optical CD calculations, library generation, and automatic channel selection. When combined with advanced machine learning algorithms, which maximize signal information, and with Nova HPC, Nova MARS® offers a complete optical CD metrology solution for Nova’s leading dimensional metrology tools. Designed for scatterometry models, Nova MARS® StackMaker provides an intuitive drag-and-drop interface for visualizing the most complex 3D device geometries. This simple yet powerful approach makes it easy for users to create new models and implement design and process changes into existing models while tracking the design evolution. Nova MARS® MatMaker is a material characterization package featuring a significantly faster regression engine that rapidly converges to the correct materials and solution parameters.
Next-generation solution for fast, high-precision inline XPS and XRF materials metrology Revolutionizing inline materials metrology, the Nova VeraFlex® LE-XRF product line is the industry standard for combined XPS and low energy XRF (LE-XRF) materials characterization. The most recent addition to the product line, Nova VeraFlex® IV LE-XRF addresses critical industry challenges across all device market segments. Higher precision and throughput are achieved by significantly increasing X-ray flux at the measurement site and integrating complementary machine learning solutions, enabling this next-generation platform to further strengthen the market leadership of the Nova VeraFlex® LE-XRF product line. Highlights and Benefits Higher Flux - System enhancements have been developed for increasing X-ray flux that generates higher photoelectron count rates and faster processing. This offers substantial throughput improvements while maintaining precise measurement performance. Measurements Where You Need It - Designed with enhanced X-ray beam alignment and control for smaller next-generation pad sizes, in-line measurements can be taken both in the scribe line and in-die on-device. XPS/XRF Sensitivity - Both XPS and LE-XRF measurements can occur simultaneously for inline and in-die applications, offering unique metrology solutions for critical yield-driving applications. Automated Health Check - Beam parameters from the electron gun and the generated X-ray beam energy are continuously monitored enabling uninterrupted high-volume manufacturing. Machine Learning - Machine learning capabilities enhancing the throughput and precision performance of new or established applications and maximize system productivity. Why VeraFlex® IV LE-XRF New material integration strategies continue to drive critical device performance improvements for advanced FinFet, Nanosheets, and novel memory structures. The VeraFlex IV LE-XRF provides the highest X-ray flux available to deliver the speed, sensitivity, and flexibility necessary to enable these performance breakthroughs.
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Advanced performance IM solution Nova i550® is a cutting-edge integrated metrology platform that provides superior metrology performance for CMP and etch process control in the most advanced logic and memory technology nodes Highlights and Benefits 01 Best Metrology Performance 02 Direct Device Measurements 03 Highest Productivity Best Metrology Performance Unique hardware and modeling capabilities that enable enhanced metrology performance Direct Device Measurements Measures logic and memory in-die structures, including complex 1D, 2D, 3D and direct devices Highest Productivity Faster throughput delivers better productivity Why Nova i550®? Nova i550® is designed to meet the process control challenges of the most advanced R&D developments and production lines. With new optics providing wider spectral information, a smaller pad size, and advanced pattern recognition to optimally support unique modeling algorithms, Nova i550® offers the industry’s highest metrology accuracy, precision and tool matching capabilities. Working in conjunction with the Nova MARS software application development platform, Nova i550® delivers advanced process control for the most advanced logic, 3D NAND double-deck structure, and advanced DRAM applications. Addressing the need for high-performance metrology closer to the process, Nova i550® significantly boosts productivity. Qualified for integration with leading vendors’ CMP and etch process equipment, the solution enables high sampling and multi-site measurement schemes. When supported by Nova’s central management, control and connectivity suite, Nova i550® offers even greater operational efficiency and advanced metrology control functionality.
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High-productivity metrology platform Nova T500® is a high-productivity metrology platform designed to address the unique challenges of the semiconductor manufacturing industry. The powerful platform delivers increased sampling rates and advanced metrology capabilities. Highlights and Benefits Industry Standard, Field Proven Platform Sets the industry standard for CMP process control, with thousands of deployments and proven reliability at customer sites, with optional field upgrades to further increase productivity Outstanding Performance Best-in-class accuracy, repeatability and tool-to-tool performance 100% Compatible to Nova i500® Utilizing the same design Engineering Station Supporting IM Product Line Used for recipe creation and as a redundancy tool that enables Pre/ Post measurement for additional sites and data collection Why Nova T500®? Nova T500® helps manufacturers meet the growing need for high productivity in advanced semiconductor manufacturing. Featuring the same optical design and having full commonality with the Nova i500® integrated metrology platform, Nova T500® completes the company’s unique, highly efficient CMP metrology and process control offering. As part of Nova’s fleet solution for semiconductor manufacturers, Nova T500® is qualified to support a broad range of tools, including Nova i500®, and is available in multiple configurations. When supported by Nova’s central management, control and connectivity suite, Nova T500® platform enhances operational efficiency and advanced metrology control functionality.
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Nova Metrion® leverages secondary ion mass spectrometry (SIMS) technology to provide information that no other inline metrology system can deliver. This includes direct, inline measurement of chemical composition at high depth resolution and data density, as well as simultaneous measurement of multiple species throughout a 300mm wafer’s film stack. Process automation with built-in film analysis and recipe management makes the Nova Metrion® system easy to use, while performing these measurements in the production fab shortens time to results. Highlights and Benefits Direct Composition Profiling Directly measures compositional profiles inline at high depth resolution and data density Built-in Film Analysis Simplifies measurements and accelerates process insight with built-in film analysis and recipe management Full Factory Automation Supports full factory automation to enable high-volume manufacturing Contamination Free Ensures worry-free use within contaminant-sensitive production environments Whole Wafer Measurements Eliminates sample preparation and enables multi-point measurements for wafer uniformity mapping Reduced Scrap and Enhanced Yield Faster time to results reduces scrap and improves yield to deliver fast return on investment (ROI) Why Inline SIMS? Delivering time-sensitive information needed to monitor and control high-volume manufacturing (HVM) workflows, inline SIMS prevents scrap, reduces rework,and enables tighter statistical process control (SPC).
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