AJA’s Stiletto-O (HV) and A300-XP-O (UHV) magnetron sputtering sources (2” & 3” target sizes) are designed specifically to fit cluster flanges for the compact Orion Systems. They feature tunable isolation chimneys with gas injection and flip-top shutters to accommodate compact spaces and custom chimney designs. The magnetron/cathode assembly is identical to the unique AJA A300 Series modular magnetrons which are used in the flagship ATC systems. The magnet array can be configured by the customer to operate in the nearly-balanced, unbalanced and magnetic material modes. Due to the compact design, the complete shutter, isolation chimney and ground shield assembly are quickly removed with only two screws for easy target access. ORION 8-Ⅱ CLUSTER FLANGE - Flange accepts up to (8) 2” sources with both con-focal and direct sputtering capabilities ORION 8-Ⅲ CLUSTER FLANGE - Flange accepts up to (5) 3” sources to allow uniform coatings over 6” diameter substrates. CUSTOM ORION CLUSTER FLANGE - Customized flange with (5) 2” UHV con-focal sputtering sources, (1) 4cm Gridded DC ion source, and (1) thermal evaporation furnace. ORION 8-Ⅱ T CLUSTER FLANGE - Flange accepts up to (4) 2” UHV sputtering sources with in-situ tilting capabilities.
