AJA's exclusive Stiletto (HV) and A300 (UHV) Series Magnetron Sputtering Sources are designed for maximum application flexibility. These unique sources feature a modular magnet array which can be configured by the customer to operate in the nearly-balanced, unbalanced (Type II)and magnetic material modes. Gas injection chimneys and shutter systems are incorporated to facilitate in-situ tilting and prevent cross-contamination and target poisoning. 3"and 4" sources can be operated at pressures below 4 x 10-4Torr in combination with an ion source to perform IBAD at half the price and complexity of an ion beam assisted ion beam sputtering system. (11) 2” UHV magnetron sputtering sources in confocal arrangement (6) 3” UHV magnetron sputtering sources in confocal arrangement, (1) 3” sputter source in direct deposition orientation (5) 4” UHV magnetron sputtering sources in confocal arrangement Up to (5) 3” UHV magnetron sputtering sources in confocal arrangement, (1) 6” UHV sputter source for direct deposition (8) 2” UHV magnetron sputtering sources in confocal geometry, (2) custom anti-shorting sputtering sources optimized for chalcogenide materials Accommodates up to (13) sputtering sources with confocal, direct and off-axis orientation Direct deposition orientation with combination of 1.5” and 2” UHV magnetron sputtering sources (11) 2” UHV magnetron sputtering sources in direct deposition orientation with 4cm gridded DC ion source
