The ideal optical test instrument for this purpose would likely provide the following: Transmission and reflection measurements, preferably probed simultaneously, from the same area on the sample, over a wide wavelength range, UV, Vis and IR. A measure of absolute absorption. Good bandwidth so that small features can be picked out in the spectrum. Analysis of layer thickness and refractive index, for single and complex multi-layer structures, so that data can be fed back to the coating process. Measurements of T and R at normal incidence and variable angles. Analysis of thin metal films and polymers. Accurate measurements on birefringent materials. The capability of making direct comparisons with defined standards. The ability to handle large or very thick samples. Colour analysis from the T and R spectra. Ideally these measurements would be made without any destructive preparation of the test piece. We aim to demonstrate in the following, that the nkd-Series has all this functionality and more and is the instrument of choice for characterising solar control films and glasses. We have demonstrated here that the nkd is a powerful and versatile analysis tool suitable for analysing all types of solar control coatings. Solar irradiance calculations are provided as standard and a coating performance summary can be generated with the click of a button. Transparent materials are measured easily on the nkd and require no sample preparation whatsoever. Glass and polymers are easily analysed using database values or the dispersion models in advanced analysis. Special metal film algorithms have ben included in the powerful Pro-Optix analysis software -allowing for the accurate determination of optical properties and layer thickness. Determination of the thickness and optical constants is quick and easy even for new and absorbing films. The nkd includes a colour analysis function which can be used for a wide variety of functions such as checking the variation of glass and tint colours across batches. Please see our application note on colour analysis for more information on this. So we can see the nkd is an ideal tool for use in development and quality control of value added glass and films.
Flexible thin film measurement instrument. The nkd-8000, is the most advanced design in our innovative range of desktop thin film measurement systems, purpose built for enhanced functionality and flexibility, to meet all your thin film analysis requirements – from research to production and quality control. Non-destructive determination of refractive index, extinction coefficient and film thickness measurement, of single or multi-layer thin films and substrates is achieved using the simultaneous measurement of Transmittance and Reflectance spectra. This capability is unique to the nkd range and guarantees photometric precision, unattainable with conventional spectrophotometers. Key features of the nkd thin film analysis systems, are the ability to capture spectra using polarised (s- and p-) or unpolarised light and at continuously varying angles of incidence, enabling thin, multilayer and complex films to be analysed with ease. The X Y mapping platform enables film thickness and refractive index profiling of entire substrates and scanning can be performed over a wide spectral range. Full data capture and thin film analysis takes only 15 minutes and the powerful Pro-Optix™ software makes the whole process of obtaining film thickness and dispersion for your coatings fast and simple. In fact, for a single layer of unknown poperties, the nkd can obtain the film thickness, refractive indices (dispersion) and absorption coefficient – from just one measurement! Transparent samples are handled with ease and are infact an advantage as they allow for the determination of absolute absorption (1-(T+R)). Transparent substrates require no roughening or blackening of the back surface - they are simply placed as manufactured on the sample stage. Metallic films are also catered for in the analysis with metal algorithms. A wide selection of accessories are available, making this the most flexible thin film analysis system available.
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Thin Film measurement on your desk top. The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance - simultaneously. No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces. Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles, (see the nkd-8000 for continuously variable angles of incidence). Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and derermining optical properties fast and simple A wide selection of accessories are available, ensuring that there is no compromise in the collected spectra.
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Thin Film measurement on your desk top. The nkd-7000 provides a unique, integrated desk top solution for all your thin film measurement needs. Non-destructive determination of refractive index (n), extinction coefficient (k) and film thickness measurement (d), of single and multi-layer thin films and substrates is achieved using the combined measurement of Transmittance and Reflectance - simultaneously. No sample preparation is required and samples are mounted on a horizontal x y platform for ease of handling and access. A range of sample platform options are available for use with thin, flexible substrates or thick, heavy slabs of material. We even have temperature-controlled and XY-stepping stages for automatic film thickness and index mapping of sample surfaces. Spectra for thin film analysis, may be measured using polarised (s- and p-) or unpolarised light, at one or three fixed angles of incidence and over a wide spectral range. These can be standard or user defined angles. Full data capture and film analysis takes only 15 minutes and the powerful Pro-Optix™ control software makes the whole process of measuring film thickness and derermining optical properties fast and simple. A wide selection of accessories are available, ensuring that there is no compromise in the collected spectra.
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Flexible measurement platforms for research. When you are developing new coatings and substrates – you need the nkd to provide you with the most spectrocopic information available from a thin film analysis system. When you have more than one type of thin film measurement to make, multiple applications and analysis of complex structures, new and absorbing films, then you need the nkd - specifically designed for the most demanding applications. It provides: – Space for larger samples – – Variable angle measurements – – Flexibility of measurement type – Measure T & R simultaneously. Determine layer thickness for single and multilayers with ease. Determine optical properties and absorption for all types of materials - transparent, absorbing, dielectric, polymers, semiconductors, organic semiconductors and polymers etc. Take advantage of advanced features such as a the heated stage, sample mapping and small spot sizes. The extensive application capabilities of the nkd include: • Transparent substrates • Thick and thin layers • High and low index (n) layers • Plastics & polymers • Optical coatings • Display technology • Organic and Inorganic semiconductors • Metal films • Dielectric films • DBR structures
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