By DREEBIT GmbH
DREEBIT GmbH offers the opportunity to perform scientific ion beam physical experiments and to irradiate customer-provided targets. Guests are invited to carry out their experiments at the high technology ion irradiation facilities located at the company site in Großroehrsdorf near Dresden, Germany. Our laboratories provide a modern infrastructure with technical support by supervising engineers, guest offices, guest access to IT services, a special laboratory for mounting ultra-high vacuum equipment, and an in-house workshop. Besides the option of renting beam time at a facility and conducting experiments or irradiating targets yourself, ion irradiation and experimental work is also offered as a service performed by DREEBIT staff members. The experiments can be conducted by PhD scientists with a profound physical knowledge, engineers, and/or technicians with a large experimental experience ensuring an optimal realization of high-precision measurements. Three irradiation facilities with a wide variety of ion beam parameters can be offered for the ion irradiation and deposition service. Micro Beam Facility Installed Ion Source: Dresden EBIS-A Ion Beam Energy: from 100 eV up to 30 keV per ionic charge Ion Beam Current: from pA up to µA (depending on ion species) Ion Beam Spot Diameter at Target Chamber: some 100 µm up to some mm Spectroscopic Equipment: Ion source: Semiconductor x-ray detectors, resolution 130 eV at Mn Kα Special Features: Option to decelerate and accelerate ions towards targets, available ion energies between 100 eV and 30 keV per charge FIB / TOF-SIMS Facility Installed Ion Source: Dresden EBIS-M* Ion Beam Energy: < 8 keV per ionic charge Ion Beam Current: up to some 100 pA (depending on ion species) Ion Beam Spot Diameter at Target Chamber: 10 µm up to 100 µm Spectroscopic Equipment: Ion source: Semiconductor x-ray detectors, resolution 130 eV at Mn Kα; Target chamber: Time-Of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) setup Special Features: Fine focussing ion optics for beam spot sizes down to approx. 10 µm for SEM imaging, TOF-SIMS analysis, and ion lithography IMALION Implanter Installed Ion Source: Dresden ECRIS-2.45M Ion Beam Energy: < 30 keV per ionic charge Ion Beam Current: up to some mA (depending on ion species) Ion Beam Spot Diameter at Target Chamber: some mm up to some 10 mm Special Features: Wide Area Irradiation Optics for homogeneous and perpendicular ion beam irradiation of targets over a width of 200 mm
