By SAMCO Inc.
TEOS-SiO₂ deposition through Cathode PECVD offers high deposition rates, low internal stress, and exceptional film uniformity. This process is ideal for applications that require precision and stability, such as optical waveguides, microlens arrays, and insulating layers for advanced device fabrication. Samco’s proprietary deposition techniques ensure superior film characteristics while maintaining compatibility with thermally sensitive substrates.
