By Montana State University - Montana Microfabrication Facility (MMF)
Photolithographic Process for S 1813 Positive Photoresist on Al Coated Si Wafer 1. Clean Al Coated Wafers 1. Heat AZ KWIK Strip Remover to 60 °C. 2. When bath is at temperature, place wafer in dish and start 10 minute timer. 3. When time is complete, take wafer out of KWIK Strip and wash off with deionized water. Blow dry with nitrogen gun. 2. Dehydration Bake 1. Place cleaned Al coated Si wafer on vacuum hot plate, and perform a dehydration bake for 10 minutes at 150 °C. Let the wafer cool to room temperature after bake. 3. Spin Coat Wafers with S 1813.
