By Intlvac
Ion Beam Etching delivers highly directional, physical removal of material using a focused ion beam. It's ideal for applications that demand exacting detail — from high-aspect-ratio etching and photomask repair to failure analysis and MEMS fabrication. By enabling clean, damage-free pattern transfer across complex materials, IBE supports innovation in quantum devices, photonics, and advanced sensors. - IC Broad Beam Delayering - IC Cross-Sectioning - Precision Thinning - High-Resolution Structural Analysis - Sub-Micron Structure Development - MEMS/NEMS Fabrication and Prototyping - Lithium Niobate Etching - Advanced Academic and Industrial R&D
