By Center for Functional Nanomaterials Brookhaven
The Electron Spectro-Microscopy (ESM) beamline hosts an aberration-corrected low-energy electron / photoemission electron microscope (Elmitec AC-LEEM/PEEM) equipped with an electron energy analyzer and operating in ultra-high vacuum (UHV), or in partial pressures of up to 10-6 Torr. The sample is illuminated either by an electron beam or by monochromatic focused soft x-ray radiation with tunable photon energy (15-1500 eV) and a beam size of 40 microns. Modes of operation include mirror electron microscopy (MEM), bright-field and dark-field LEEM, selected area low-energy electron diffraction (µ-LEED), selected-area angle-resolved photoelectron spectroscopy (µ-ARPES), X-ray photoelectron spectroscopy (XPS), and XPEEM for spatially resolved elemental imaging. The microscope is best suited for micro- spectroscopic investigation of conductive, crystalline surfaces with few nanometers spatial resolution. The system has a capability for in-situ physical vapor deposition and/or gas dosing. The sample temperature can be controlled from 80K to 1800K. The XPEEM/LEEM Spectro-Microscopy Endstation, as a part of the comprehensive Electron Spectro- Microscopy Facility at NSLS-II, provides unique capabilities for full-field surface topographic, crystallographic, and spectroscopic analysis at the nanoscale.
