By Institut Catala de Nanociencia i Nanotecnologia (ICN2)
Accurate structural characterization of epitaxial thin films making use of advanced X-ray diffraction techniques (reciprocal space mapping under non-ambient conditions and external stimuli: gas change, voltage, illumination). Our unit carries out advanced structural characterisation of thin films, primarily by X-ray diffraction as well as working on the development of advanced methods for the characterisation by X-ray diffraction of epitaxial thin films. These include in-plane diffraction, GIXRD analysis, as well as 3D reciprocal space mapping. This microstructure research is complemented with HRTEM characterisation.
