By SAMCO Inc.
SiH4-SiNx deposition using Samco’s Anode-Coupled PECVD systems provides a reliable solution for forming silicon nitride films with excellent uniformity, low stress, and high optical quality. This process supports a wide range of applications, including dielectric layers, passivation films, and hard masks in device fabrication. With precise control over deposition parameters, SiH4-SiNx films can achieve tailored properties such as high mechanical strength, low leakage current, and optimal refractive indices. The process is ideal for both R&D and production environments, delivering stable, reproducible results across diverse applications.
