By ASML
Software also coordinates the behavior of the powerful mechatronic modules inside our lithography systems (also known as ‘scanners’). It is needed to position the silicon wafers at rapid speed, with nanometer precision. Our scanner metrology software helps measure and compensate for the sub-nanometer inaccuracies that inevitably creep in during production due to material imperfections, temperature fluctuations or atmospheric pressure changes. It calculates how our hardware should behave to correct for this, coordinating the many components to maximize system performance.
