By Center for Functional Nanomaterials Brookhaven
Confocal Photoluminescence/Fluorescence and Electroluminescence Microscopy This is a CFN manufactured confocal scanning microscope based on a Olympus IX81 inverted microscope with dual color pulsed laser excitation (440nm and 532nmt), Silicon-based photon counting detectors (400-1100nm range) for time-resolved two-color and polarization photoluminescence imaging, and an Acton SP2750-Pixis100 spectrograph-CCD system for micro-PL spectroscopy (400-1100nm range). The microscope has single nanostructure sensitivity iand it performs single photon source characterization for quantum materials. The system is equipped with a liquid He cryostat (4.5K) and can be coupled with a Nanosurf AFM for correlative confocal/AFM imaging. Confocal Hyperspectral Dark Field/ Bright Field/Fluorescence Imaging Microscopy with Single Nanoparticle Sensitivity This is a commercial NT&C NanoMicoSpec Nikon Eclipe T2 inverted microscope equipped with a laser driven white light ultrastable It performs confocal hyperspectral dark field scattering, fluorescence iand absorption. Single nanoparticle sensitivity is available in both scattering and fluorescence modes. Confocal Hyperspectral High-Speed Laser Scanning Fluorescence Microscopy with Multiphoton Capability A commercial Leica TCS SP5 laser-scanning confocal/multiphoton fluorescence microscope is available for users wishing to perform fast scanning/imaging (video rate) of fluorescent samples. It includes several continuous wave lasers (Ar-ion 457nm, 488nm, 514nm, He Ne 543nm and 632nm) for hyperspectral confocal imaging and a broad band ultrafast Ti:Sapphire oscillator (MaiTai Spectra Physics) for multiphoton and second harmonic imaging microscopy Scanning Photocurrent Microscopy This is a CFN manufactured instrument based on an inverted Olympus IX81 microscope equipped with 488nm, 561nm and 632nm lasers, a 50x long working distance objective lens, and with reflection image capability. It offers users with the ability to record photocurrent maps with 400nm resolution with samples usually integrated in a FET format, measure carrier diffusion lengths. FET samples can be built in the CFN clean room facility, including wire bonding.
