By Jan Koum Center for Nanoscience and Nanotechnology, Tel Aviv University
Lithography at TAU.nano enables high-precision patterning with resolutions ranging from 10 nanometers to several microns, facilitating advanced research and development in nanotechnolog Mask Aligner MA6/BA GEN4 Photolithography (micron features). E-Beam Lithography Raith 150 Ⅱ E-beam lithography (nanometer features).
