By Center for Functional Nanomaterials Brookhaven
Contact: Chang-Yong Nam and Gregory Doerk The group supports a thin-film materials processing laboratory outside the cleanroom environment, which includes facilities for air-free materials processing and atomic layer deposition (ALD) of inorganic thin films. The laboratory also includes small, versatile versions of the Nanofabrication Facility toolset such as facilities for organic film deposition by spin-coating and thermal processing in vacuum or inert gas environments. A March Plasma CS1701F reactive ion etch tool supports SF6, CHF3, CF4, CF3Br, and O2 gas chemistries. Metal film deposition by thermal evaporation and DC magnetron sputtering is supported by a Kurt J. Lesker PVD75 tool. The laboratory includes chemical fume hoods and optical microscopes for sample processing and inspection. Hitachi 4800 SEM and JEOL-7600F (analytical SEM) status and related information
