By Nanoscribe
Industrial replication by nanoimprint lithography. Two-Photon Grayscale Lithography (2GL ®) enables the microfabrication of freeform micro-optics, microlens arrays or diffractive micro-optics, with highest precision. These 2.5D microstructures printed on a wafer are efficient master templates for the replication process via nanoimprint lithography (NIL). From prototyping to mass production by NIL. For high-volume production of 2.5D microstructures the well-established replication technique nanoimprint lithography (NIL) is a highly productive solution. The basic NIL process comprises three steps: First, a master stamp is manufactured. This is the structure from which identical copies are made during the replication process. Next, a soft working stamp is molded from the master, showing the exact negative features of the master template. The final replicas are fabricated as imprints of the working stamp and thus as identical copies of the original master structure. Special techniques such as step and repeat NIL can help for scaling up this process by replicating a single-die master to a fully populated 8” master. Check the feasibility of your project.
