By ASML
Computational lithography software is a relatively new field in the semiconductor industry. It’s a technique that’s used to reconstruct the reticle mask, because the structures patterned onto a silicon wafer deform when we scale down to nanometer resolutions. Our work in computational lithography focuses on developing accurate predictions of the semiconductor patterning process. However, today’s advanced chips have billions of transistors and the resulting simulation models can quickly become computationally intensive. So, our computational software also finds clever ways to simplify the model.
