By Intlvac
Produce ultra-clean, uniform lift-off metallization patterns using the Intlvac Nanochrome II Electron Beam Evaporation System. Lift-off deposition is a patterning technique that involves depositing thin, highly uniform, high-quality films onto pre-patterned substrates. After deposition, the sacrificial photoresist layer is dissolved, “lifting off” unwanted material and leaving behind a precisely defined pattern. This process is essential for creating intricate microelectronic features, sensors, and MEMS structures where edge definition and film integrity are critical. Intlvac’s vacuum systems deliver the uniformity and material control necessary for successful lift-off processes at both research and production scales.
