By Jan Koum Center for Nanoscience and Nanotechnology, Tel Aviv University
Manufacturer and model: Heidelberg-Instrument DWL 66fs. Description: High-Resolution Laser writer, mask fabrication tool and Photolithography Solutions. Ideal for microelectronics, MEMS, microfluidics, sensors, non-standard substrates, and advanced packaging. Equipped with cutting-edge mask fabrication machines, our facility ensures unparalleled precision in photolithography mask production. This supports research and development (R&D) applications where accuracy and high-resolution patterning are critical.
