NW
Precision DepositionFabrication & Surface Engineering

Microwave plasma chemical vapour diamond deposition

By Melbourne Centre for Nanofabrication

The process Diamond deposition is a chemical vapour deposition process which uses a continuous microwave source to heat hydrogen and carbon (in the form of methane) to between 700°C and 1000°C. This breaks down the atoms to become a highly reactive plasma. When the plasma interacts with an existing diamond sample surface, the hydrogen stabilises the diamond structure, while the methane adds new carbon to the diamond lattice. The systems are capable of fabricating either single or polycrystalline diamond as well as boron doped diamond. The uses Diamond is highly useful in a wide range of applications, such the study of quantum phenomena, electronics and medical bionics. Diamond is an ideal material for bionic devices which need to be both biocompatible and suitable for long-term implant. It is a highly robust and hermetic material which makes it perfect for encasing and protecting electronics from body fluids. Furthermore, when doped with boron it can conduct electrons, predisposing it to use in electronics. Nitrogen vacancy diamond displays interesting photo-luminescence properties which can be exploited for quantum information systems. The instruments MCN has two Seki Diamond Microwave Systems - AX6500X and AX6300. The AX6500X is used for growing ultra-high purity and nitrogen vacancy diamond, while the AX6300 is used for growing boron-doped diamond.