By XRnanotech
We utilize cutting-edge Displacement Talbot Lithography (DTL) technology to create superior products. Periodic structures are patterned with resolutions down to 300 nm on wafer scales up to 8 inches, surpassing standard photolithography. This tool (Phable R200) offers high resolution, exceptional depth of focus, and flawless patterning free from stitching errors. With DTL, we develop groundbreaking optical components and advanced structures for various applications, gratings, lenses and overall beamline supply. Trust us to deliver the highest quality, precision-engineered products using the latest in lithography technology.
