The Nanometer Pattern Generation System (NPGS) is the top selling SEM lithography system at research institutions in North America and its use has become widespread around the world.The objective for NPGS is to provide a powerful, versatile, and easy to use system for doing advanced electron beam lithography or ion beam lithography using a commercial SEM (Scanning Electron Microscope), STEM (Scanning Transmission Electron Microscope), FIB (Focused Ion Beam), dual beam (SEM/FIB), or Helium Ion microscope. The success of NPGS at meeting this goal is demonstrated by the strong recommendations from current users.
Bozeman
Montana
1988
