By Laurell Technologies Corporation
The Universal Dispenser is Laurell's most advanced dispense system and it's very affordable. Hundreds now in use! - Multiple dispenses without dripping! - Repeatable dispense amounts of less than 1 ml. Now, with the microliter precision software enhancement and careful optimization, 10 µl ±3 µl is possible - Adjustable rate suck-back control (no drips or air bubbles generated) - Simple, straightforward, easy-to-use and maintain design - Can be used with syringe, pump or pressure vessel material source (requires configuration and additional items not included with the standard option list pricing) - Thousands of hours of successful factory and field testing with materials up to 8,000 cP - Adjustable locking ball mount configurations available for positioning, designated as UD-3 b - ECTFE construction and FFKM O-rings assure the ultimate chemical resistance
Spin Coaters and Spin Processors. Models shown: Laurell EDC Spin Processor with Touch Control and foot switch, Laurell H6-8 Headless, Laurell EDC Spin Processor in Wet Station, Laurell H6-8 Spin Processor in Wet Station.
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Using the right chuck improves coating quality. High porosity chucks for standard cover slip sizes and embedded chucks for standard microscope slides are available direct from Laurell. If you have an unusual shape and/or size substrate, a custom chuck can be made for a perfect fit.
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Spin Coaters and Spin Processors. Models shown: Laurell H6-23 Headless, Laurell H6-23 with extended upper housing, Laurell WS-650-23 wet station, Laurell Spin Coater with Single Shot Dispenser (SSD).
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